SINTERON
500 A benchtop system that offers high peak energy,
pulsed light technology to quickly heat and fuse conductive metallic
ink flakes and nano inks at room temperature without significantly
heating the substrate or adjacent thermally sensitive components.
Has adjustable exposure intensity ranging from 290-830 joules with
three exposure area options; 7.6x7.8cm, 1.9-30cm and 30.5x 30.5cm.
System consists of a table top controller, separate lamp housing,
sintering chamber and lamp housing air cooling.
SINTERON
2000 Provides a high energy, pulsed light for reliable,
repeatable sintering of conductive nano particles on heat sensitive
materials. The system features a high intensity pulsed xenon lamp
that provides a broadband spectrum, from 240nm to 1000nm with adjustable
pulse energy up to 1500 Joules/pulse. Selectable pulse duration:
572 to 2044µs. Sintering area: 1.9x30.5cm.
The SINTERON 2000 offers the flexibility to adjust both the energy
delivered to the flashlamp and the pulse width. The pulse width
can be adjusted to four different preset values. The energy to the
flashlamp can be controlled by setting the voltage on the system.
This exceptional flexibility makes evaluating and deploying easy.
SINTERON
2010 The system provides a high energy, pulsed
light for reliable, repeatable sintering of conductive nano particles
on heat sensitive materials. The system features a high intensity
pulsed xenon lamp that provides a broadband spectrum, from 240nm
to 1000nm with adjustable energy up to 2000 Joules/pulse. Selectable
pulse duration: 100 to 2000µs. Adjustable pulse energy: 200
- 2000 Joules. Sintering area: 1.9 x 30.5cm.
The SINTERON 2010 offers the flexibility to adjust both the energy
delivered to the flashlamp and the pulse width. The pulse width
can be adjusted to two different preset values, 1.5ms or 2.0ms,
or adjusted over a range from 0.1ms to 1.0ms. The energy to the
flashlamp can be controlled by setting the voltage on the system.
This exceptional flexibility makes evaluating and deploying easy.
LS-845This
linear stage is a benchtop unit that integrates the LH-840 linear
lamp housing to provide a single axis linear motion for area sintering
applications using the SINTERON 500, 2000 or 2010. Users can select
both the pulse energy level and the pulse duration delivered to the
flashlamp using one of the SINTERON systems. The LS-845 assists the
operator in determining the exposure conditions for the substrate.
The user may select different operating parameters that control the
movement of the table as the samples pass under the flashing lamp.
SINTERON
500 A benchtop system that offers high peak energy,
pulsed light technology to quickly heat and fuse conductive metallic
ink flakes and nano inks at room temperature without significantly
heating the substrate or adjacent thermally sensitive components.
Has adjustable exposure intensity ranging from 290-830 joules with
three exposure area options; 7.6x7.8cm, 1.9-30cm and 30.5x 30.5cm.
System consists of a table top controller, separate lamp housing,
sintering chamber and lamp housing air cooling.
SINTERON
2000 Provides a high energy, pulsed light for reliable,
repeatable sintering of conductive nano particles on heat sensitive
materials. The system features a high intensity pulsed xenon lamp
that provides a broadband spectrum, from 240nm to 1000nm with adjustable
pulse energy up to 1500 Joules/pulse. Selectable pulse duration:
572 to 2044µs. Sintering area: 1.9x30.5cm.
SINTERON
2010 The system provides a high energy, pulsed
light for reliable, repeatable sintering of conductive nano particles
on heat sensitive materials. The system features a high intensity
pulsed xenon lamp that provides a broadband spectrum, from 240nm
to 1000nm with adjustable energy up to 2000 Joules/pulse. Selectable
pulse duration: 100 to 2000µs. Adjustable pulse energy: 200
- 2000 Joules. Sintering area: 1.9 x 30.5cm.
LS-845This
linear stage is a benchtop unit that integrates the LH-840 linear
lamp housing to provide a single axis linear motion for area sintering
applications using the SINTERON 500, 2000 or 2010. Users can select
both the pulse energy level and the pulse duration delivered to the
flashlamp using one of the SINTERON systems. The LS-845 assists the
operator in determining the exposure conditions for the substrate.
The user may select different operating parameters that control the
movement of the table as the samples pass under the flashing lamp.
